Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
| Author | |
| Year of Publication |
1999
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| Date Published |
Jan-01-1999
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| Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
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| Volume |
17
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| Start Page or Article ID (correct) |
3340
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| ISSN Number |
07342101
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| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
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| Publication Status |