Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
| Author | |
|---|---|
| Year of Publication |
1999
|
| Date Published |
Jan-01-1999
|
| Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
|
| Volume |
17
|
| Start Page or Article ID |
3340
|
| ISSN Number |
07342101
|
| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
|
|
| Publication Status |