TY - JOUR
AU - R. Goodman
AU - N. Materer
AU - Stephen Leone
BT - Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
DA - Jan-01-1999
DO - 10.1116/1.582063
PY - 1999
EP - 3340
T2 - Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
TI - Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
VL - 17
SN - 07342101
ER -