@article{6826,
  author = {R. Goodman and N. Materer and Stephen Leone},
  title = {Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields},
  year = {1999},
  journal = {Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films},
  volume = {17},
  pages = {3340},
  month = {Jan-01-1999},
  issn = {07342101},
  doi = {10.1116/1.582063},
}