Laser single-photon ionization mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)
| Author | |
| Year of Publication |
1997
|
| Date Published |
Jan-07-1997
|
| Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
|
| Volume |
15
|
| Start Page or Article ID (correct) |
2134
|
| ISSN Number |
07342101
|
| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
|
|
| Publication Status |