Film quality in relation to deposition conditions of a-SI:H films deposited by the \textquoteleft\textquotelefthot wire\textquoteright\textquoteright method using highly diluted silane

Author
Year of Publication
1996
Date Published
Jan-01-1996
Journal Title
Journal of Applied Physics
Volume
79
Start Page or Article ID (correct)
7278
ISSN Number
00218979
DOI
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