Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
| Author | |
|---|---|
| Year of Publication |
1992
|
| Date Published |
Jan-09-1992
|
| Journal Title |
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures
|
| Volume |
10
|
| Start Page or Article ID |
2217
|
| ISSN Number |
0734211X
|
| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
|
|
| Publication Status |