@article{4905,
  author = {F. Campos and G. Weaver and C. Waltman and Stephen Leone},
  title = {Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV},
  year = {1992},
  journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures},
  volume = {10},
  pages = {2217},
  month = {Jan-09-1992},
  issn = {0734211X},
  doi = {10.1116/1.586192},
}