TY - JOUR
AU - F. Campos
AU - G. Weaver
AU - C. Waltman
AU - Stephen Leone
BT - Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures
DA - Jan-09-1992
DO - 10.1116/1.586192
PY - 1992
EP - 2217
T2 - Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures
TI - Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
VL - 10
SN - 0734211X
ER -