Ion-Enhanced Etching of Si(100) with Molecular Chlorine:~ Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux
| Author | |
| Year of Publication |
2000
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| Date Published |
Jan-04-2000
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| Journal Title |
The Journal of Physical Chemistry B
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| Volume |
104
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| Start Page or Article ID (correct) |
3261-3266
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| ISSN Number |
1520-6106
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| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
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| Publication Status |