TY - JOUR
AU - N. Materer
AU - R. Goodman
AU - Stephen Leone
BT - The Journal of Physical Chemistry B
DA - Jan-04-2000
DO - 10.1021/jp993278q
PY - 2000
SP - 3261
EP - 3266
T2 - The Journal of Physical Chemistry B
TI - Ion-Enhanced Etching of Si(100) with Molecular Chlorine:~ Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux
VL - 104
SN - 1520-6106
ER -