Amorphous silicon deposition rates in diode and triode discharges
Author | |
Year of Publication |
1986
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Date Published |
Jan-01-1986
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Journal Title |
Journal of Applied Physics
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Volume |
60
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Start Page or Article ID (correct) |
1369
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ISSN Number |
00218979
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DOI | |
Download citation | |
JILA PI | |
Journal Article
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Publication Status |