A hyperthermal (0.1\textendash4 eV) F atom beam source suitable for surface etching investigations
| Author | |
|---|---|
| Year of Publication |
1990
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| Date Published |
Jan-07-1990
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| Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
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| Volume |
8
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| Start Page or Article ID |
3118
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| ISSN Number |
07342101
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| DOI | |
| Download citation | |
| JILA PI | |
Journal Article
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| Publication Status |