Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
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Abstract |
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Year of Conference |
2021
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Conference Name |
Novel Patterning Technologies 2021
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Volume |
11610
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Start Page or Article ID |
1161010
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Date Published |
2021-02
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Publisher |
SPIE
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ISBN Number |
9781510640535
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DOI |
10.1117/12.2595038
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Download citation | |
Publication Status | |
JILA PI | |
JILA Topics | |
Group Name & Research Topics | |
Conference Proceedings
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