A new metrology technique for defect inspection via coherent Fourier scatterometry using orbital angular momentum beams

Author
Keywords
Abstract
Year of Conference
2021
Conference Name
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Volume
11611
Start Page or Article ID
76-90
Date Published
2021-02
Publisher
SPIE
URL
https://doi.org/10.1117/12.2584728
DOI
10.1117/12.2584728
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Publication Status
Associated Institutes
JILA PI
JILA Topics
Group Name & Research Topics
Conference Proceedings