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Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection

TitleQuantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection
Publication TypeConference Paper
Year of Publication2014
AuthorsZhang, B, Adams, DE, Seaberg, MD, Gardner, DF, Shanblatt, ER, Kapteyn, HC, Murnane, MM
EditorCain, JP, Sanchez, MI
Conference NameSPIE Proceedings: SPIE Advanced LithographyMetrology, Inspection, and Process Control for Microlithography XXVIII
PublisherSPIE
Conference LocationSan Jose, California, USA
URLhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2046526
DOI10.1117/12.2046526