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Production of higher silanes in radio frequency SiH4 and H2-SiH4 plasmas

TitleProduction of higher silanes in radio frequency SiH4 and H2-SiH4 plasmas
Publication TypeJournal Article
Year of Publication2004
AuthorsHorvath, P, Rozsa, K, Gallagher, AC
JournalJournal of Applied Physics
Volume96
Issue12
Pagination7660
Date PublishedJan-01-2004
ISSN00218979
DOI10.1063/1.1786666
Short TitleJ. Appl. Phys.