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Laser single-photon ionization mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)

TitleLaser single-photon ionization mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)
Publication TypeJournal Article
Year of Publication1997
AuthorsMaterer, N, Goodman, RS, Leone, SR
JournalJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume15
Issue4
Pagination2134
Date PublishedJan-07-1997
ISSN07342101
DOI10.1116/1.580619
Short TitleJ. Vac. Sci. Technol. A