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Amorphous silicon deposition rates in diode and triode discharges

TitleAmorphous silicon deposition rates in diode and triode discharges
Publication TypeJournal Article
Year of Publication1986
AuthorsGallagher, AC
JournalJournal of Applied Physics
Volume60
Issue4
Pagination1369
Date PublishedJan-01-1986
ISSN00218979
DOI10.1063/1.337312
Short TitleJ. Appl. Phys.