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Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams

TitleReliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams
Publication TypeConference Paper
Year of Publication2016
AuthorsHernandez-Charpak, J, Frazer, T, Knobloch, JL, Hoogeboom-Pot, KM, Nardi, D, Chao, W, Jiang, L, Tripp, M, King, S, Kapteyn, HC, Murnane, MM
EditorSanchez, MI, Ukraintsev, VA
Conference NameSPIE Advanced LithographyMetrology, Inspection, and Process Control for Microlithography XXX, SPIE Proceedings
PublisherSPIE
Conference LocationSan Jose, California, United States
URLhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2219434
DOI10.1117/12.2219434

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