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A hyperthermal (0.1–4 eV) F atom beam source suitable for surface etching investigations

TitleA hyperthermal (0.1–4 eV) F atom beam source suitable for surface etching investigations
Publication TypeJournal Article
Year of Publication1990
AuthorsLevis, RJ, Waltman, CJ, Cousins, LM, R. Copeland, G, Leone, SR
JournalJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume8
Issue4
Pagination3118
Date PublishedJan-07-1990
ISSN07342101
DOI10.1116/1.576594
Short TitleJ. Vac. Sci. Technol. A