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Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition

TitleNanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition
Publication TypeJournal Article
Year of Publication1996
AuthorsTanenbaum, DM, Laracuente, AL, Gallagher, AC
JournalApplied Physics Letters
Volume68
Issue12
Pagination1705
Date PublishedJan-01-1996
ISSN00036951
DOI10.1063/1.115912
Short TitleAppl. Phys. Lett.

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