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Proceedings of SPIE: Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source

TitleProceedings of SPIE: Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source
Publication TypeConference Paper
Year of Publication2012
AuthorsSeaberg, MD, Adams, DE, Zhang, B, Gardner, DF, Murnane, MM, Kapteyn, HC
Conference NameMetrology, Inspection, and Process Control for Microlithography XXVI
PublisherSPIE
Conference LocationSan Jose, California, USA
DOI10.1117/12.916524

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