TY - JOUR
AU - D. Tanenbaum
AU - A. Laracuente
AU - Alan Gallagher
BT - Applied Physics Letters
DA - Jan-01-1996
DO - 10.1063/1.115912
PY - 1996
EP - 1705
T2 - Applied Physics Letters
TI - Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition
VL - 68
SN - 00036951
ER -