@article{338,
  author = {N. Materer and R. Goodman and Stephen Leone},
  title = {Temperature dependence of neutral and positively charged Si and SiCl etch products during argon-ion-enhanced etching of Si(100) by Cl2},
  year = {2000},
  journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures},
  volume = {18},
  pages = {191},
  month = {Jan-01-2000},
  issn = {0734211X},
  doi = {10.1116/1.591171},
}